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Studies on the effect of substrate temperature on the modification process of a thin layer of polystyrene samples deposited on glass by using spin coating technique have been conducted. The polystyrene thin film surface was modified by using nitrogen plasma generated in a vacuum reactor by a capacitive plasma generator with a frequency of 40 kHz. The substrate temperature was set by variation of 60, 70 and 80 °C during the modification process to determine the effect of substrate temperature on the level of roughness and hydrophobicity of the film. Observations were conducted by using optical microscopy, optical micro-profiler, and measuring the contact angle of liquid. The results showed a decrease in roughness due to modification at a temperature of 60 °C and 70 °C. On the other hand, the treatment at a temperature of 80 °C resulted in an increase of roughness. By measuring the contact angle, it was proven that hydrophobicity is not only influenced by the surface roughness of thin layers.

The Effect of Substrate Temperature on Surface Modification of Polystyrene by using Nitrogen Plasma