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An instrument has been developed for precision controlled exposures ofelectronic devices and material samples in particle beams. The instrumentprovides simultaneously a real time record of the profile of the beam and thefluence received. The system is capable of treating devices with dimensionalscales ranging from millimeters to extended objects of cross sections measuredin tens of square centimeters. The instrument has been demonstrated to operateeffectively in integrated fluences ranging up to a few times $10^{16}$1-MeV-neutron-equivalent/cm$^{2}$ (n$_{\textrm{eq}}$). The positioner portionof the system comprises a set of remotely controllable sample holdersincorporating cooling and interfaces for sample power and readout, allconstructed from low activation technologies. The monitoring component of thesystem samples the current or voltage of radiation tolerant silicon diodesplaced directly in the path of the beam.

journal of instrumentation

An Instrument for Precision Controlled Radiation Exposures, Charged Beam  Profile Measurement, and Real-time Fluence Monitoring Beyond $10^{16}$  n$_{\textrm{eq}}$/cm$^{2}$