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The experimental study of effects of deposition conditions and plasma parameters on the structure of titanium oxide films is presented. The films are deposited by reactive deposition from a plasma generated by a pulsed cathodic vacuum arc source. The effects of deposition time and substrate bias voltage are studied, the films being deposited at different substrate temperatures. Bragg-Brentano X-ray diffraction and electron microscopy were used to investigate the structure of deposited films. Correlation between plasma parameters, deposition conditions and structure of synthesized films are established.SCOPUS: cp.jinfo:eu-repo/semantics/publishe

Titanium oxide thin film deposition by pulsed arc vacuum plasma