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This work presents a wafer-scale method of microsupercapacitor (MSC) fabrication. Deposition of the electrode precursor, i.e. graphene oxide, is accomplished through spin-coating which allows for potential application in CMOS compatible processes for future integrated on-chip energy storage systems. Our MSCs have an areal capacitance of 0.4 mF/cm2at 10 μA, which is a very promising result. Further, the MSC has good rate capability as its capacitance decreases by only 0.03 mF/cm2when the current increases to 50 μA. The MSCs have a maximum energy density of 0.04 μWh/cm2and a maximum power density as high as 96 μW/cm2. Additionally, the wafer-scale process demonstrates industrial viability.

Toward CMOS compatible wafer-scale fabrication of carbon-based microsupercapacitors for IoT