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Technological advancements are strongly required to fulfill the demands ofnew accelerator devices with the highest accelerating gradients and operationreliability for the future colliders. To this purpose an extensive R&Dregarding molybdenum coatings on copper is in progress. In this contribution wedescribe chemical composition, deposition quality and resistivity properties ofdifferent molybdenum coatings obtained via sputtering. The deposited films arethick metallic disorder layers with different resistivity values above andbelow the molibdenum dioxide reference value. Chemical and electricalproperties of these sputtered coatings have been characterized by Rutherfordbackscattering, XANES and photoemission spectroscopy. We will also present athree cells standing wave section coated by a molybdenum layer $\sim$ 500 nmthick designed to improve the performance of X-Band accelerating systems.

Molybdenum sputtering film characterization for high gradient accelerating structures