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In this work, the authors fabricated Cu2O porous nanostructured films (PNFs)on glass slide substrates by the newly developed positive bias depositionapproach in a balanced magnetron sputtering (MS) system. It was found that thesurface morphology, crystal structure and optical property of the as-depositedproducts were greatly dependent on the applied positive substrate bias. Inparticular, when the substrate was biased at +50 V and +150 V, both of theas-prepared Cu2O PNFs exhibited a unique triangular pyramids-like structurewith obvious edges and corners and little gluing, a preferred orientation of(111) and a blue shift of energy band gap at 2.35 eV. Quantitative calculationresults indicated that the traditional bombardment effects of electrons andsputtering argon ions were both negligible during the bias deposition in thebalanced MS system. Instead, a new model of tip charging effect was furtherproposed to account for the controllable formation of PNFs by the balanced biassputtering deposition.

Cu2O porous nanostructured films fabricated by positive bias sputtering deposition