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We report on a new approach, entirely based on electron-beam lithographytechnique, to contact electrically, in a four-probe scheme, singlenanostructures obtained by self-assembly. In our procedure, nanostructures ofinterest are localised and contacted in the same fabrication step. Thistechnique has been developed to study the field-induced reversal of an internalcomponent of an asymmetric Bloch domain wall observed in elongated structuressuch as Fe(110) dots. We have focused on the control, using an externalmagnetic field, of the magnetisation orientation within N\'eel caps thatterminate the domain wall at both interfaces. Preliminary magneto-transportmeasurements are discussed demonstrating that single Fe(110) dots have beencontacted.

Contacting individual Fe(110) dots in a single electron-beam lithography step