English (United Kingdom)

https://curated-unify.zendy.io/wp-json/zendy-region/v1/featured_content/oa?rat=en

https://curated-unify.zendy.io/wp-json/zendy-region/v1/highlighted_journal/

Global: Zendy Tools annual

Presents the keyphrase highlighting as premium feature

Keyphrase Highlighting

Presents the summarisation as premium feature

Summarisation

Insights

Presents the pdf analysis as premium feature

PDF Analysis

Presents the zaia usage as premium feature

ZAIA

Global: Zendy Tools monthly

Global: Zendy Plus monthly

Presents the access of premium content as premium feature

Premium Content

Global: Zendy Plus annual

Global: Zendy Free Plan

We report on a nanoscale patterning method on Si substrates usingself-assembled metal islands and low-energy ion-beam irradiation. The Sinanostructures produced on the Si substrate have a one-to-one correspondencewith the self-assembled metal (Ag, Au, Pt) nanoislands initially grown on thesubstrate. The surface morphology and the structure of the irradiated surfacewere studied by high-resolution transmission electron microscopy (HRTEM). TEMimages of ion-beam irradiated samples show the formation of sawtooth-likestructures on Si. Removing metal islands and the ion-beam induced amorphous Siby etching, we obtain a crystalline nanostructure of Si. The smalleststructures emit red light when exposed to a UV light. The size of thenanostructures on Si is governed by the size of the self-assembled metalnanoparticles grown on the substrate for this replica nanopatterning. Themethod can easily be extended for tuning the size of the Si nanostructures bythe proper choice of the metal nanoparticles and the ion energy inion-irradiation. It is suggested that off-normal irradiation can also be usedfor tuning the size of the nanostructures.Comment: 12 pages, 7 figures, regular paper submitted to Nanotechnolog

Replicating nanostructures on silicon by low-energy ion beams