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Manufacturing superconducting circuits out of ultrathin films is achallenging task when it comes to patterning complex compounds, which arelikely to be deteriorated by the patterning process. With the purpose ofdeveloping high-T$_c$ superconducting photon detectors, we designed a novelroute to pattern ultrathin YBCO films down to the nanometric scale. We believethat our method, based on a specific use of a focused-ion beam, consists inlocally implanting Ga^{3+} ions and/or defects instead of etching the film.This protocol could be of interest to engineer high-T$_c$ superconductingdevices (SQUIDS, SIS/SIN junctions and Josephson junctions), as well as totreat other sensitive compounds.

Patterning of ultrathin YBCO nanowires using a new focused-ion-beam process