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Surface functionalization of PMMA by Aminolysis reaction was utilised along with the addition of inorganic photo stabilisers (Zn(II), Ni(II), Cu(II) and Co(II)) to enhance the photostability of PMMA under exposure to UV light. The new polymers were characterised via different spectroscopic techniques. In order to assess the effectiveness of the PMMA films, Tinuvin 622, a commercial photo-stabiliser, was employed to assess the photostabilizing efficiency of our approach. The results have shown that Copper chloride was the most effective photostabilizer, followed by nickel, cobalt, and zinc chloride, in that order.

Surface modification of poly(methyl methacrylate)-sulphadiazine complexes as self photostabilizer against Ultraviolet (UV) Irradiation