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A virtual instrument, calorimetric etching solution analyzer based on LabVIEW 2010 platform was developed, characterized and validated for the  on-line  automated H 2 O 2  concentration monitoring in SC-1 etching solution applied in the semiconductor industry. The virtual instrument completely controls all analyzer functions including sampling, analytical response measurement, digital data processing and H 2 O 2  concentration calculation as well as the instrument calibration and real time concentration correction by fresh solution addition to the etching machine. The hardware, the software, the user interface and the instrument functioning are presented and discussed with the analytical characterization and validation by industrial sample analysis in comparison with a standard permanganate method.

LabView based virtual calorimetric etching solution analyzer (CESA) for the online quantification of hydrogen peroxide for the semiconductor industry