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vanadium pentoxide films(V 2 O 5 ) were deposited on sapphire substrates under four different oxygen partial pressures by magnetron sputtering. Then the films’ crystallinity, surface morphology and optical mutation properties were researched. The results show that all the prepared films are polycrystalline V 2 O 5 , and the crystallization performance gets better with the oxygen pressure increases. In addition, the Root-Mean-Square(RMS) roughness decrease with the increase of oxygen pressure. Furthermore, with the oxygen pressure increases, the optical turn-off time and turn-on time are 2.2 and 36 ms, respectively down to 1.7 and 30 ms, and before/after phase-change transmittance, meanwhile, decreases from 75%/20% to 57%/11%, showing a great improvement in optical mutation properties.

Surface Morphology and Optical Mutation Properties of V 2 O 5 Films Prepared with Different Oxygen Partial Pressures