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This paper proposes a plasmonic grating-based Refractive index sensor. A defect region is set up in the plasmonic grating. A special transmission mode nearis excited in the stop band of the plasmonic grating. When a nano-metallic slit is introduced in the defect region, a special resonance phenomena, Fano resonance, emerges. The tuning of Fano resonance can be observed by engineering the structural parameters of the device. The sensing principle is analyzed through the numerical investigation FDTD (Finite difference in time-domain) method. This sensor’s performance is quantified using sensitivity. The proposed sensor reports high sensitivity (S = 1250 nm/RIU) with an ultra-narrow line width of 10 nm. The study opens a means for the designing of on-chip optical sensors that will be viable in bio-sensing and chemical sensing.

Plasmonic Grating-Based Refractive Index Sensor with High Sensitivity