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Silicon nanowires (SiNWs) possess advantages over bulk silicon, such as higher surface-to-volume ratio and light trapping capability. The metal-assisted chemical etching fabricates SiNWs, and anodisation-electropolishing lifts off a free-standing film of the vertically aligned nanowires. The paper shows the reusability of the substrate for cost-effectiveness with a minute change in the surface roughness. Owing to multiple controlling and output parameters involved during fabrication, optimising process parameters for a specific application by the factorial method is expensive and tedious. Pure Taguchi design struggles with a multi-response system, whereas the Grey relational analysis converts the multi-response system to a single-response system by assigning grades. The Grey Taguchi design optimises the fabrication parameters for the optimum outcome, which is validated by experimentation.

Free-standing nanowire layer-transfer parametric optimisation of multi-response process by Grey Taguchi design