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In this study, we fabricated magnetic ion-imprinted polymers (IIP) for arsenic removal. Ion-imprinted method was developed by complexing N-methacryloyl-l-cysteine (MAC) monomer and As(III) and As(V) as template molecules. The utilization of the MAC-As complex was chosen to provide a rebinding of As(III) and As(V) on IIP. The template molecules were removed by using 0.01 M HNO 3  containing 0.05% thiourea solution as a desorption agent. The adsorption of As(III) and As(V) was ideal in buffer solution pH 5.0 for 120 min with removal capacity. The ion-imprinted-based magnetic nanoparticles were selective for arsenic toward other analogs (NO 3− , PO 43- , SO 42-  as an anion, and AsO 2− , HAsO 4−  as an oxi-anion). The adsorption isotherm model fitted the Langmuir model with an R 2  value of 0.9935–0.9118 and the Q max  values of 91.7 mg/g for As(III)-IIP magnetic nanoparticles and 99.0 mg/g As(V)-IIP nanoparticles, respectively. Finally, IIP-based magnetic nanoparticle adsorbents have been utilized successfully for effective arsenic removal from wastewater samples.

Development of ion imprinted based magnetic nanoparticles for selective removal of arsenic (III) and arsenic (V) from wastewater