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Next generation EUV sources for photolithography use light produced bylaser-produced plasmas (LPP) from ablated tin droplets. A major challenge forextending the lifetime of these devices is mitigating damage caused bydeposition of tin debris on the sensitive collection mirror. Especiallydifficult to stop are high energy (up to 10 keV) highly charged tin ionscreated in the plasma. Existing solutions include the use of stopping gas,electric fields, and magnetic fields. One common configuration consists of amagnetic field perpendicular to the EUV emission direction, but such a systemcan result in ion populations that are trapped rather than removed. Weinvestigate a previously unconsidered mitigation geometry consisting of amagnetic null by performing full-orbit integration of the ion trajectories inan EUV system with realistic dimensions, and optimize the coil locations forthe null configuration. The magnetic null prevents a fraction of ions fromhitting the mirror comparable to that of the perpendicular field, but does nottrap any ions due to the chaotic nature of ion trajectories that pass close tothe null. This technology can potentially improve LPP-based EUVphotolithography system efficiency and lifetime, and may allow for a different,more efficient formulation of buffer gas.

EUV Debris Mitigation using Magnetic Nulls