English (United Kingdom)

https://curated-unify.zendy.io/wp-json/zendy-region/v1/featured_content/oa?rat=en

https://curated-unify.zendy.io/wp-json/zendy-region/v1/highlighted_journal/

Global: Zendy Plus annual

Presents the access of premium content as premium feature

Premium Content

Presents the keyphrase highlighting as premium feature

Keyphrase Highlighting

Presents the summarisation as premium feature

Summarisation

Insights

Presents the pdf analysis as premium feature

PDF Analysis

Presents the zaia usage as premium feature

ZAIA

Global: Zendy Plus monthly

Global: Zendy Tools annual

Global: Zendy Tools monthly

Global: Zendy Free Plan

The release process for the fabrication of freestanding oxide microstructuresrelies on appropriate, controllable and repeatable wet etching procedures.SrTiO3 is among the most employed substrates for oxide thin films growth andcan be decomposed in HF:water solution. Such process is strongly anisotropicand is affected by local defects and substrate cut-plane. We analyze theetching behavior of SrTiO3 substrates having (100), (110), and (111) cut-planesduring immersion in a 5% HF:water solution. The etching process over the threesubstrates is compared in terms of pitting, anisotropy, macroscopic etch rateand underetching effects around HF-resistant (La,Sr)MnO3 thin filmmicropatterns. The release of targeted structures, such as the reported(La,Sr)MnO3 freestanding microbridges, depends on the substratecrystallographic symmetry and on the in-plane orientation of the structuresthemselves along the planar directions. By comparing the etching evolution attwo different length scales, we distinguish two regimes for the propagation ofthe etching front: an intrinsic one, owning to a specific lattice direction,and a macroscopic one, resulting from the mixing of different etching fronts.We report the morphologies of the etched SrTiO3 surfaces and the geometries ofthe underetched regions as well as of the microbridge clamping zones. Thereported analysis will enable the design of complex MEMS devices by allowing tomodel the evolution of the etching process required for the release ofarbitrary structures made of oxide thin films deposited on top of STO.

The role of etching anisotropy in the fabrication of freestanding oxide microstructures on SrTiO3(100), SrTiO3(110), and SrTiO3(111) substrates