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In0.53Ga0.47As/ In0.52Al0.48As single quantum well structures grown by molecular beam epitaxy were pulse annealed by a halogen lamp to determine the stability of their optical properties after such thermal treatment. The annealing time and temperature were 5 s and 650–850 °C, respectively. The shift in energy of the main peak in the low‐temperature photoluminescence spectra was modeled by considering Al‐Ga interdiffusion at the heterointerface and solving the appropriate Schrödinger equation for this region. The estimated interdiffusion constants D are ∼10−16–10−15 cm2/s in this temperature range, which are almost three orders higher than the corresponding values reported for GaAs/ AlxGa1−xAs. For longer annealing times, up to 30 min, the linewidth (full width at half‐maximum) of the excitonic transition in the 11 K photoluminescence spectrum continuously decreased from 12.5 to 7.7 meV, while the intensity maintained a high value

Interdiffusion and wavelength modification in In0.53Ga0.47As/ In0.52Al0.48As quantum wells by lamp annealing