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Intense hard x-ray pulses from a free-electron laser induce irreversiblestructural damage in a perovskite oxide epitaxial heterostructure when pulsefluences exceed a threshold value. The intensity of x-ray diffraction from a25-nm thick epitaxial BiFeO$_{3}$ layer on a SrTiO$_{3}$ substrate measuredusing a series of pulses decreases abruptly with a per-pulse fluence of 2.7 x10$^{6}$ photons ${\mu}$m$^{-2}$ at 9.7 keV photon energy, but remains constantfor 1.3 x 10$^{6}$ photons ${\mu}$m$^{-2}$ or less. The damage resulted in thedestruction of the BiFeO$_{3}$ thin film within the focal spot area and theformation of a deep cavity penetrating into the STO substrate via the removalof tens of nanometers of material per pulse. The damage threshold occurs at afluence that is insufficient to heat the absorption volume to the meltingpoint. The morphology of the ablated sample is consistent with fracture ratherthan melting. Together these results indicate that the damage occurs via anon-thermal process consistent with ultrafast ionization of the absorptionvolume.

Non-thermal fluence threshold for femtosecond pulsed x-ray radiation damage in perovskite complex oxide epitaxial heterostructures