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Laser-induced plasma formation and subsequent relaxation in solid dielectricsis the precursor to structural modifications that are accompanied by apermanent alteration of material properties. The decay of the electron-holeplasma through distinct relaxation channels determines the properties of theresulting modification. Based on an experimental arrangement combining atime-resolved transmission measurement with a cross-phase modulationmeasurement, we isolate the plasma formation and relaxation dynamics in thebulk of amorphous fused silica excited by femtosecond short-wavelength infrared($\lambda =\,2100\,$nm) laser pulses. Whereas the relaxation time of thegenerated electron-hole plasma was so far assumed to be constant, our findingsindicate an intensity-dependent relaxation time. We attribute this intensitydependence to vibrational detrapping of self-trapped excitons.

Plasma formation and relaxation dynamics in fused silica driven by femtosecond short-wavelength infrared laser pulses