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Aluminum nitride (AlN) plays a key role in modern power electronics anddeep-ultraviolet photonics, where an understanding of its thermal properties isessential. Here we measure the thermal conductivity of crystalline AlN by the3${\omega}$ method, finding it ranges from 674 ${\pm}$ 56 W/m/K at 100 K to 186${\pm}$ 7 W/m/K at 400 K, with a value of 237 ${\pm}$ 6 W/m/K at roomtemperature. We compare these data with analytical models and first principlescalculations, taking into account atomic-scale defects (O, Si, C impurities,and Al vacancies). We find Al vacancies play the greatest role in reducingthermal conductivity because of the largest mass-difference scattering.Modeling also reveals that 10% of heat conduction is contributed by phononswith long mean free paths, over ~7 ${\mu}$m at room temperature, and 50% byphonons with MFPs over ~0.3 ${\mu}$m. Consequently, the effective thermalconductivity of AlN is strongly reduced in sub-micron thin films or devices dueto phonon-boundary scattering.

Thermal conductivity of crystalline AlN and the influence of atomic-scale defects