English (United Kingdom)

https://curated-unify.zendy.io/wp-json/zendy-region/v1/featured_content/oa?rat=en

https://curated-unify.zendy.io/wp-json/zendy-region/v1/highlighted_journal/

Global: Zendy Plus annual

Presents the access of premium content as premium feature

Premium Content

Presents the keyphrase highlighting as premium feature

Keyphrase Highlighting

Presents the summarisation as premium feature

Summarisation

Insights

Presents the pdf analysis as premium feature

PDF Analysis

Presents the zaia usage as premium feature

ZAIA

Global: Zendy Tools annual

Global: Zendy Free Plan

Global: Zendy Tools monthly

Global: Zendy Plus monthly

We report the first direct demonstration of possibility to generate theextreme ultraviolet (EUV) radiation with a freely expanding jet of dense plasmawith multiply-charged ions supported by high-power microwaves. The detectedemission power is about 20 W at 18--50 nm for argon and xenon and 0.3 W at13--17 nm for xenon. The discharge with a peak electron density up to $3\times10^{16}\,$cm$^{-3}$ and a characteristic size of $150\,\mu$m is supported by afocused radiation of a recently developed gyrotron with unique characteristics,250~kW output power at 250~GHz, operating in a relatively long (50$\,\mu$s)pulse mode. Up-scaling of these experimental results gives grounds fordevelopment of a point-like kilowatt-level EUV source for a high-resolutionlithography able to fulfill requirements of the microelectronics industry.

Observation of extreme-ultraviolet light emission from an expanding plasma jet with multiply-charged argon or xenon ions