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Near surface silver nanoparticles embedded in silicon oxide were obtained by40 keV silver negative ion implantation without the requirement of an annealingstep. Ion beam induced local heating within the film leads to an exo-diffusionof the silver ions towards the film surface resulting in the protrusion oflarger nanoparticles. Cross-sectional transmission electron microscopy (XTEM)reveals the presence of poly-disperse nanoparticles (NPs), ranging between 2nm-20 nm, at different depths of the SiO2 film. The normal incidencereflectance spectrum shows a double kink feature in the vicinity of 400nm,indicating a strong localized surface plasmon resonance (LSPR) from theembedded NPs. However, due to overlap of the bilayer interference and LSPR, therelated features are difficult to separate. The ambiguity in associating thecorrect kink with the LSPR related absorption is cleared with the use oftransfer matrix simulations in combination with an effective mediumapproximation. The simulations are further verified with angle dependentreflectance measurements. Additionally, transfer matrix simulation is also usedto calculate the electric field intensity profile through the depth of thefilm, wherein an enhanced electric field intensity is predicted at the surfaceof the implanted films.

Angle dependent localized surface plasmon resonance from silver nanoparticles embedded in SiO2 thin film