English (United Kingdom)

https://curated-unify.zendy.io/wp-json/zendy-region/v1/featured_content/oa?rat=en

https://curated-unify.zendy.io/wp-json/zendy-region/v1/highlighted_journal/

Global: Zendy Plus annual

Presents the access of premium content as premium feature

Premium Content

Presents the keyphrase highlighting as premium feature

Keyphrase Highlighting

Presents the summarisation as premium feature

Summarisation

Insights

Presents the pdf analysis as premium feature

PDF Analysis

Presents the zaia usage as premium feature

ZAIA

Global: Zendy Plus monthly

Global: Zendy Tools annual

Global: Zendy Tools monthly

Global: Zendy Free Plan

The next generation of lithography machines uses extreme ultraviolet (EUV)light originating from laser-produced plasma (LPP) sources, where a small tindroplet is ionized by an intense laser pulse to emit the requested light at13.5 nm. Numerous irradiation schemes have been explored to increase conversionefficiency (CE), out of which a double-pulse approach comprising a weakpicosecond Nd:YAG pre-pulse followed by a powerful pulse is considered to bevery promising [1]. Nevertheless, even for such CE-optimized schemes, iondebris ejected from the plasma with kinetic energies up to several keV remain afactor that hampers the maximum performance of LPP sources. In this letter wepropose a novel pre-pulse scheme consisting of a picosecond pulse pair at 1064nm, which decreases the amount of undesirable fast ions, avoidsback-reflections to the lasers and enables one to tailor the target shape.

Controlling ion kinetic energy distributions in laser produced plasma sources by means of a picosecond pulse pair