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The next generation low-background detectors operating deep underground aimfor unprecedented low levels of radioactive backgrounds. The deposition andpresence of radon progeny on detector surfaces is an added source of energeticbackground events. In addition to limiting the detector material's radonexposure in order to reduce potential surface backgrounds, it is just asimportant to clean surfaces to remove inevitable contamination. Such studies ofradon progeny removal have generally found that a form of etching is effectiveat removing some of the progeny (Bi and Pb), however more aggressivetechniques, including electropolishing, have been shown to effectively removethe Po atoms. In the absence of an aggressive etch, a significant fraction ofthe Po atoms are believed to either remain behind within the surface orredeposit from the etching solution back onto the surface. We explore thechemical nature of the aqueous Po ions and the effect of the oxidation state ofPo to maximize the Po ions remaining in the etching solution of contaminated Cusurfaces. We present a review of the previous studies of surface radon progenyremoval and our findings on the role of oxidizing agents and a cell potentialin the preparation of a clean etching technique.

A Review and Outlook for the Removal of Radon-Generated Po-210 Surface Contamination