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Caesium-covered surfaces are used in negative hydrogen ion sources as a low work function converter for H–/D– surface production. The work function χ of the converter surface is one of the key parameters determining the performance of the ion source. Under idealized conditions, pure bulk Cs has 2.14 eV. However, residual gases at ion source background pressures of 10−7–10−6 mbar and the plasma surface interaction with the hydrogen discharge in front of the caesiated surface dynamically affect the actual surface work function. Necessary fundamental investigations on the resulting χ are performed at a dedicated laboratory experiment. Under the vacuum conditions of ion sources, the incorporation of impurities into the Cs layer leads to very stable Cs compounds. The result is a minimal work function of χvac ≈ 2.75 eV for Cs evaporation rates of up to 10 mg/h independent of substrate material and surface temperature (up to 260 °C). Moreover, a distinct degradation behavior can be observed in the absence of a C...

Influence of H2 and D2 plasmas on the work function of caesiated materials