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The high density of RF-DC plasma N2-H2 was used to make precisemicro-texturing onto AISI420 has complex textured geometry. The original 2Dmicro-patterns were drawn onto substrate surface by maskless patterning usingby of nano-carbon ink. These micro-patterned specimens were furtherplasma-nitrided at 673 K for 5.4 ks by 70 Pa using the hollow cathode device.The emissive light spectroscopy shows species in plasma were nitrogen atomstogether with NH radicals and nitrogen molecular ions. Unprinted surface areashad selectively nitrided, have high nitrogen solute contents up to 12 mass%.Masked area just corresponded to carbon-mapping from printed nano-carbon inks,while unprinted surface to nitrogen mapping. The hardness profile had stepwisechange across the borders between these printed and unprinted areas; e.g., thehardness on unprinted surface was 1200 Hv while it remained to be 350 Hv onprinted surface. This selective nitriding and hardening enabled to constructthe 3D textured miniature dies and products by chemical etching of printedarea. These two peaks were related to extended martensitic lattice by highnitrogen extraordinary solid solution. The phase transformation frommartensitic lattice {\alpha}prime-Fe through expanded phase into{\epsilon}-Fe3N lattice.

The effect of RF-DC plasma N2-H2 in the selective hardening process for micro-patterned AISI420