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We quantify the dependence of the single-shot ablation threshold on the angleof incidence and polarization of a femtosecond laser beam, for three dissimilarsolid-state materials: a metal, a dielectric and a semiconductor. Using theconstant, linear value of the index of refraction, we calculate the laserfluence transmitted through the air-material interface at the point of ablationthreshold. We show that, in spite of the highly nonlinear ionization dynamicsinvolved in the ablation process, the so defined transmitted threshold fluenceis universally independent of the angle of incidence and polarization of thelaser beam for all three material types. We suggest that angular dependence ofablation threshold can be utilized for profiling fluence distributions inultra-intense femtosecond laser beams.

Universal threshold for femtosecond laser ablation with oblique illumination