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Point island models (PIMs) are presented for the formation of supportednanoclusters (or islands) during deposition on flat crystalline substrates atlower submonolayer coverages. These models treat islands as occupying a singleadsorption site, although carrying a label to track their size (i.e., theysuppress island structure). However, they are particularly effective indescribing the island size and spatial distributions. In fact, these PIMsprovide fundamental insight into the key features for homogeneous nucleationand growth processes on surfaces. PIMs are also versatile being readily adaptedto treat both diffusion-limited and attachment-limited growth, and also avariety of other nucleation processes with modified mechanisms. Their behavioris readily and precisely assessed by kinetic Monte Carlo simulation.

Point Island Models for Nucleation and Growth of Supported Nanoclusters during Surface Deposition