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Fe-Si binary compounds have been fabricated by focused electron beam induceddeposition by the alternating use of iron pentacarbonyl, Fe(CO)5, andneopentasilane, Si5H12 as precursor gases. The fabrication procedure consistedin preparing multilayer structures which were treated by low-energy electronirradiation and annealing to induce atomic species intermixing. In this way weare able to fabricate FeSi and Fe3Si binary compounds from [Fe=Si]2 and[Fe3=Si]2 multilayers, as shown by transmission electron microscopyinvestigations. This fabrication procedure is useful to obtain nanostructuredbinary alloys from precursors which compete for adsorption sites during growthand, therefore, cannot be used simultaneously.

journal of applied physics

Fabrication of FeSi and Fe3Si compounds by electron beam induced mixing  of [Fe/Si]2 and [Fe3/Si]2 multilayers grown by focused electron beam induced  deposition