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We report on how the relaxation of patterns prepared on a thin film can becontrolled by manipu- lating the symmetry of the initial shape. The validity ofa lubrication theory for the capillary-driven relaxation of surface profiles isverified by atomic force microscopy measurements, performed on films that werepatterned using focused laser spike annealing. In particular, we observe thatthe shape of the surface profile at late times is entirely determined by theinitial symmetry of the perturba- tion, in agreement with the theory. Moreover,in this regime the perturbation amplitude relaxes as a power-law in time, withan exponent that is also related to the initial symmetry. The results haverelevance in the dynamical control of topographic perturbations fornanolithography and high density memory storage.

Symmetry Plays a Key Role in the Erasing of Patterned Surface Features