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A new platform for fabricating polariton lasers operating at room temperatureis introduced: nitride-based distributed Bragg reflectors epitaxially grown onpatterned silicon substrates. The patterning allows for an enhanced strainrelaxation thereby enabling to stack a large number of crack-free AlN/AlGaNpairs and achieve cavity quality factors of several thousands with a largespatial homogeneity. GaN and ZnO active regions are epitaxially grown thereonand the cavities are completed with top dielectric Bragg reflectors. The twostructures display strong-coupling and polariton lasing at room temperature andconstitute an intermediate step in the way towards integrated polaritondevices.

Patterned silicon substrates: a common platform for room temperature GaN and ZnO polariton lasers