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Transmission electron microscopy (TEM) study on morphological changes in goldnanostructures deposited on Si (100) upon annealing under different vacuumconditions has been reported. Au thin films of thickness ~2.0 nm were depositedunder high vacuum condition (with the native oxide at the interface of Au andSi) using thermal evaporation. In-situ, high temperature (from room temperature(RT) to 850\degreeC) real time TEM measurements showed the evaluation of goldnanoparticles into rectangular/square shaped gold silicide structures. This hasbeen attributed to selective thermal decomposition of native oxide layer.Ex-situ annealing in low vacuum (10-2 mbar) at 850\degreeC showed no growth ofnano-gold silicide structures. Under low vacuum annealing conditions, thecreation of oxide could be dominating compared to the decomposition of oxidelayers resulting in the formation of barrier layer between Au and Si.

Dynamic and Static Transmission Electron Microscopy Studies on Structural Evaluation of Au nano islands on Si (100) Surface