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We fabricated NiFe2O thin films on MgAl2O4 (001) substrates by reactive dcmagnetron co-sputtering in a pure oxygen atmosphere at different substratetemperatures. The film properties were investigated by various techniques witha focus on their structure, surface topography, magnetic characteristics, andtransport properties. Structural analysis revealed a good crystallization withepitaxial growth and low roughness and a similar quality as in films grown bypulsed laser deposition. Electrical conductivity measurements showed high roomtemperature resistivity (12 Ohmm), but low activation energy, indicating anextrinsic transport mechanism. A band gap of about 1.55 eV was found by opticalspectroscopy. Detailed x-ray spectroscopy studies confirmed the samples to beferrimagnetic with fully compensated Fe moments. By comparison with multipletcalculations of the spectra we found that the cation valencies are to a largeextent Ni2+ and Fe3+.

Physical characteristics and cation distribution of NiFe2O4 thin films with high resistivity prepared by reactive co-sputtering