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This research was made possible by funding of the Australian Research Council. Oxygen-implanted Tantalum films were provided by Dr. S. Ruffell and Dr. J. England of Varian Semiconductor Equipment, a Division of Applied Materials, as part of a broader collaboration funded by an Australian Research Council Linkage Project Grant. The stay of P.L.G. at the ANU was made possible by a Grant No. 10209/12-3 from CAPES (Brazil). S.K.N. gratefully acknowledges RSAA for his Ph.D. scholarship.

journal of applied physics

A high-energy electron scattering study of the electronic structure and elemental composition of O-implanted Ta films used for the fabrication of memristor devices