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Films of NixW1−x oxide with 0.05 ≤ x ≤ 0.53 were produced by reactive dc magnetron co-sputtering onto Si. Such films have documented electrochromism. Spectroscopic ellipsometry was used to extract accurate data on the dielectric function in the photon range 0.062 to 5.62 eV. The results for 0.62 to 5.62 eV were compared with computations from the Bruggeman effective medium theory applied to two nanostructural models: one representing a random mixture of structural entities characterized by the dielectric functions of WO3 and NiWO4 and the other describing a random mixture of WO3 and NiO. Unambiguous evidence was found in favor of the former model, and hence the films are composed of nanosized tungsten oxide and nickel tungstate. This agrees excellently with an earlier investigation of ours on NixW1−x oxide films, where nanostructure was inferred from Raman spectroscopy, x-ray photoelectron spectroscopy, and x-ray diffraction

Ellipsometrically determined optical properties of nickel-containing tungsten oxide thin films: Nanostructure inferred from effective medium theory