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Nanothermochromic diffraction gratings based on the metal-insulatortransition of $\mathrm{VO_2}$ are fabricated by site-selective ion beamimplantation in a $\mathrm{SiO_2}$ matrix. Gratings were defined either (i)directly by spatially selective ion beam synthesis or (ii) by site-selectivedeactivation of the phase transition by ion beam induced defects. The strongestincrease of the diffracted light intensities was observed at a wavelength of1550\,nm exceeding a factor of 20 for the selectively deactivated gratings. Theobserved pronounced thermal hysteresis extending down close to room temperaturemakes this system ideally suited for optical memory applications.

Ion beam synthesis of nanothermochromic diffraction gratings with giant switching contrast at telecom wavelengths