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We present optical investigations of rectangular surface plasmon polaritonwaveguides lithographically defined on GaAs substrates. The plasmon propagationlength is directly determined using a confocal microscope, with independentpolarization control in both excitation and detection channels. Surface plasmonpolaritons are launched along the waveguide using a lithographically defineddefect at one end. At the remote end of the waveguide they scatter into thefar-field, where they are imaged using a CCD camera. By monitoring the lengthdependence of the intensity of scattered light from the waveguide end, wedirectly extract the propagation length, obtaining values ranging from LSPP =10-40 {\mu}m depending on the waveguide width (w=2-5 {\mu}m) and excitationwavelength (760-920 nm). Results are in good accord with theoreticalexpectations demonstrating the high quality of the lithographically definedstructures. The results obtained are of strong relevance for the development offuture semiconductor based integrated plasmonic technologies.

Direct measurement of plasmon propagation lengths on lithographically defined metallic waveguides on GaAs