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The magnetization behavior of Co/Pd multilayers has been analyzed as a function of the degree of interfacial mixing among the Co and Pd layers. Controlled atomic mixing was induced by low‐dose and low‐flux ion implantation and a follow‐up of the structural status of the samples was made by simulation of the high‐angle x‐ray‐diffraction data. Values of the saturation magnetization as a function of the broadness of Co concentration profile are presented and explained by a simple model based on the parameters obtained from the x‐ray simulations.

Structural and magnetic behavior of Ar+-implanted Co/Pd multilayers: Interfacial mixing