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Heteroepitaxial spinel ferrites NiFe2O4 and CoFe2O4 films have been preparedby pulsed laser deposition (PLD) at various temperatures (175 - 690 {\deg}C)under ozone/oxygen pressure of 10 mTorr. Due to enhanced kinetic energy ofablated species at low pressure and enhanced oxidation power of ozone, epitaxyhas been achieved at significantly lower temperatures than previously reported.Films grown at temperature below 550 {\deg}C show a novel growth mode, which weterm "vertical step-flow" growth mode. Epitaxial spinel ferrite films withatomically flat surface over large areas and enhanced magnetic moment can beroutinely obtained. Interestingly, the growth mode is independent of the natureof substrates (spinel MgAl2O4, perovskite SrTiO3, and rock salt MgO) and filmthicknesses. The underlying growth mechanism is discussed.

A Robust Approach for the Growth of Epitaxial Spinel Ferrite Films