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Precise control of surface properties including electrical characteristics,wettability, and friction is a prerequisite for manufacturing modern organicelectronic devices. The successful combination of bottom up approaches foraligning and orienting the molecules and top down techniques to structure thesubstrate on the nano and micrometer scale allows the cost efficientfabrication and integration of future organic light emitting diodes and organicthin film transistors. One possibility for the top down patterning of a surfaceis to utilize different surface free energies or wetting properties of afunctional group. Here, we used friction force microscopy (FFM) to revealchemical patterns inscribed by a photolithographic process into aphotosensitive surface layer. FFM allowed the simultaneous visualization of atleast three different chemical surface terminations. The underlying mechanismis related to changes in the chemical interaction between probe and filmsurface.

Hierarchy of adhesion forces in patterns of photoreactive surface layers