English (United Kingdom)

https://curated-unify.zendy.io/wp-json/zendy-region/v1/featured_content/oa?rat=en

https://curated-unify.zendy.io/wp-json/zendy-region/v1/highlighted_journal/

Zendy Plus

Presents the access of premium content as premium feature

Premium Content

Presents the keyphrase highlighting as premium feature

Keyphrase Highlighting

Presents the summarisation as premium feature

Summarisation

Insights

Presents the pdf analysis as premium feature

PDF Analysis

Presents the zaia usage as premium feature

ZAIA

Zendy Tools

Zendy Open

Imaging mechanisms in piezoresponse force microscopy (PFM) in the high frequency regime above the first contact resonance are analyzed. High frequency (HF) imaging enables the effective use of resonance enhancement to amplify weak signals, improves the signal to noise ratio, minimizes the electrostatic contribution to the signal, and improves electrical contact. The limiting factors in HF PFM include inertial stiffening, deteriorating signal transduction, laser spot effects, and the photodetector bandwidth. Analytical expressions for these limits are derived. High-quality PFM operation in the 1-10 MHz frequency range is demonstrated and prospects for imaging in the 10-100 MHz range are discussed. (c) 2007 American Institute of Physics

High frequency piezoresponse force microscopy in the 1-10MHz regime