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Focused-ion-beam milling is used to fabricate nanostencil masks suitable forthe fabrication of magnetic nanostructures relevant for spin transfer torquestudies. Nanostencil masks are used to define the device dimensions prior tothe growth of the thin film stack. They consist of a wet etch resistant toplayer and an insulator on top of a pre-patterned bottom electrode. Theinsulator supports a hard mask and gives rise to an undercut by its selectiveetching. The approach is demonstrated by fabricating current perpendicular tothe plane Co/Cu/Co nanopillar junctions, which exhibit current-inducedmagnetization dynamics.

Focused-ion-beam milling based nanostencil mask fabrication for spin transfer torque studies