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Laser-induced Ni(Pt) germanosilicide formation on Si1−xGex∕Si substrate has resulted in the formation of smooth Ni(Pt) germanosilicide/Si interface with minimum interface roughness which is preferred as a contact material. A confined (self-limiting) melting phenomenon occurred during the laser-induced silicidation process at laser fluence of 0.4Jcm−2 (just at the melting threshold of the sample). This phenomenon is caused by significant differences in material properties of Si1−xGex alloy and Si substrates. Formation of highly textured [Ni1−v(Pt)v](Si1−yGey) phase was detected in the sample after 20-pulsed laser thermal annealing at 0.4Jcm−2. The formation mechanism of the Ni(Pt) monogermanosilicide is discussed.

Laser-induced Ni(Pt) germanosilicide formation through a self-limiting melting phenomenon on Si1−xGex∕Si heterostructure