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Carbon nitride (CNx) thin films were grown by direct N-2/Ar ion beam\udsputtering of a graphite target at moderate substrate temperatures\ud(300-750 K). The resulting microstructure of the films was studied by\udhigh-resolution transmission electron microscopy. The images showed the\udpresence of curved basal planes in fullerenelike arrangements. The\udachievement and evolution of these microstructural features are\uddiscussed in terms of nitrogen incorporation, film-forming flux, and\udion bombardment effects, thus adding to the understanding of the\udformation mechanisms of curved graphitic structures in CNx materials.\ud(C) 2005 American Institute of Physics

Fullerenelike arrangements in carbon nitride thin films grown by direct ion beam sputtering