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The interface stability of Zr-based high-k dielectrics with an oxide buffer layer was explored with x-ray (hυ=1254eV) and ultraviolet (hυ=21.2eV) photoemission spectroscopy. Zirconium oxide films were grown and characterized in situ in a stepwise sequence to explore their chemical stability and electronic properties as a function of film thickness and processing conditions. The buffer layers serve to lower the interface state density and to address the high temperature instabilities of ZrO2 in direct contact with Si. This research addresses three issues: (1) the development of the band offsets and electronic structure during the low temperature (T 700°C). Annealing the as-grown films to 600°C results in an ∼2eV shift of the ZrO2-Si band alignment, giving a band offset that is, favorable to devices, in agreement wi...

Interface instabilities and electronic properties of ZrO2 on silicon (100)