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The effect of plasma irradiation is studied systematically on a 4H polytype(002) oriented ${\rm CdI_2}$ stoichiometric film having compressive residualstress. Plasma irradiation was found to change the orientation to (110) of thefilm at certain moderate irradiation distances. A linear decrease in grain sizeand residual stress was observed with decreasing irradiation distance (orincreasing ion energy) consistent with both structural and morphologicalobservations. The direct optical energy gap ${\rm E_g}$ was found to increaselinearly at the rate ${\rm 15\mu eV/atm}$ with the compressive stress. Thecombined data of present compressive stress and from earlier reported tensilestress show a consistent trend of ${\rm E_g}$ change with stress. Theiodine-iodine distance in the unit cell could be responsible for the observedchange in ${\rm E_g}$ with stress.Comment: 13 pages and 10 fi

Effect of energetic ion irradiation on CdI2 films