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The redissolution behavior of gettered iron was studied in p-type Czochralski-grown silicon with a doping level of 2.5×10exp14 cm−3 and an oxide precipitate density of 5×10exp9 cm−3. The concentrations of interstitial iron and iron–boron pairs were measured by deep level transient spectroscopy. It was found that the dependence of redissolved iron concentration on annealing time can be fitted by the function C(t)=C_0[1−exp(−t/tau_diss)], and the dissolution rate tau−1diss has an Arrhenius-type temperature dependence of tau−1diss=4.01×10exp4 × exp[−(1.47±0.10) eV/k_BT] s−1. Based on this empirical equation, we predict how stable the gettered iron is during different annealing sequences and discuss implications for optimization of internal gettering.Peer reviewe

Thermal stability of internal gettering of iron in silicon and its impact on optimization of gettering