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Electron-stimulated desorption ion angular distribution (ESDIAD) and temperature-programmed desorption (TPD) techniques have been employed to study radiation-induced decomposition of fractional monolayer SF6 films physisorbed on Ru(0001) at 25 K. Our focus is on the origin of F+ and F− ions, which dominate ESD from fractional monolayers. F− ions escape only in off-normal directions and originate from undissociated molecules. The origins of F+ ions are more complicated. The F+ ions from electron-stimulated desorption of molecularly adsorbed SF6 desorb in off-normal directions, in symmetric ESDIAD patterns. Electron beam exposure leads to formation of SFx (x=0–5) fragments, which become the source of positive ions in normal and off-normal directions. Electron exposure >1016 cm−2 results in decomposition of the entire adsorbed SF6 layer.

Effects of electron irradiation on structure and bonding of SF6 on Ru(0001)