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An possible reason why the activated carbon used in the exhaust facility of real semiconductor production factory could not be regenerated by scCO 2  regeneration was estimated to be attributable to its high boiling point adsorbates which showed a peak in TGA (Thermogravimetric analysis) curve at 400-900°C. This study was conducted to experimentally verify the above insight by using TGA analysis and scCO 2  regeneration for the real samples with different loads from the factory. The experimental results showed that high boiling point ratio defined by TGA analysis was less than 4.0% in case of the heating treatment temperature of 200 °C in the exhasut facility of real semiconductor production factory. This result suggested regeneration rate of the activated carbon was higher than 80%. Our scCO 2  regeneration process can achieve high efficiency as a practical application.

Practical Reuse of Activated Carbon in the Exhaust Facility of Semiconductor Production Factory with Supercritical Carbon Dioxide Regeneration